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Condensed Matter > Materials Science

Title: Spin transport in non-degenerate Si with a spin MOSFET structure at room temperature

Authors: Tomoyuki Sasaki (1), Yuichiro Ando (2,3), Makoto Kameno (2), Takayuki Tahara (3), Hayato Koike (1), Tohru Oikawa (1), Toshio Suzuki (4), Masashi Shiraishi (2 and 3) ((1) TDK Co. Japan, (2) Kyoto Univ., (3) Osaka Univ., (4) AIT, Japan)
Abstract: Spin transport in non-degenerate semiconductors is expected to pave a way to the creation of spin transistors, spin logic devices and reconfigurable logic circuits, because room temperature (RT) spin transport in Si has already been achieved. However, RT spin transport has been limited to degenerate Si, which makes it difficult to produce spin-based signals because a gate electric field cannot be used to manipulate such signals. Here, we report the experimental demonstration of spin transport in non-degenerate Si with a spin metal-oxide-semiconductor field-effect transistor (MOSFET) structure. We successfully observed the modulation of the Hanle-type spin precession signals, which is a characteristic spin dynamics in non-degenerate semiconductor. We obtained long spin transport of more than 20 {\mu}m and spin rotation, greater than 4{\pi} at RT. We also observed gate-induced modulation of spin transport signals at RT. The modulation of spin diffusion length as a function of a gate voltage was successfully observed, which we attributed to the Elliott-Yafet spin relaxation mechanism. These achievements are expected to make avenues to create of practical Si-based spin MOSFETs.
Comments: 23 pages, 5 figures (To appear in Physical Review Applied), the first three authors equally contributed to this work
Subjects: Materials Science (cond-mat.mtrl-sci); Mesoscale and Nanoscale Physics (cond-mat.mes-hall)
Cite as: arXiv:1409.2178 [cond-mat.mtrl-sci]
  (or arXiv:1409.2178v1 [cond-mat.mtrl-sci] for this version)

Submission history

From: Masashi Shiraishi [view email]
[v1] Sun, 7 Sep 2014 23:53:27 GMT (2486kb)

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