Title: On the Ferroelectric Polarization Switching of Hafnium Zirconium Oxide in Ferroelectric/Dielectric Stack

Abstract: The ferroelectric polarization switching in ferroelectric hafnium zirconium oxide (Hf$_{0.5}$Zr$_{0.5}$O$_2$, HZO) in the HZO/Al$_2$O$_3$ ferroelectric/dielectric stack is investigated systematically by capacitance-voltage and polarization-voltage measurements. The thickness of dielectric layer is found to have surprisingly unexpected but significant impact on the ferroelectric polarization switching of ferroelectric HZO. A suppression of ferroelectricity is observed with thick dielectric layer. The difference between thick and thin dielectric layer is attributed to the leakage-current-assist switching through the dielectric layer and a theoretical explanation is provided. The interfacial coupling effect between the ferroelectric layer and dielectric layer is also observed, showing a capacitance enhancement compared to ferroelectric capacitor and dielectric capacitor in series. This work unveils some of the critical parts of the long-standing confusions and debating related to negative capacitance field-effect transistors (NC-FETs) concepts and experiments. It also addresses an important question that ferroelectric field-effect transistors can offer DC enhancement from the perspective of ferroelectric switching only, suggesting the potential of using ferroelectric-gated field-effect transistors for low-power logic applications.