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Physics > Instrumentation and Detectors
Title: Alpha spectrometric characterization of thin $^{233}$U sources for $^{229\text{(m)}}$Th production
(Submitted on 6 Apr 2020 (v1), last revised 16 Nov 2020 (this version, v2))
Abstract: Four different techniques were applied for the production of $^{233}$U alpha recoil ion sources, providing $^{229}$Th ions. They were compared with respect to a minimum energy spread of the $^{229}$Th recoil ions, using the emitted alpha particles as an indicator. The techniques of Molecular Plating, Drop-on-Demand inkjet printing, chelation from dilute nitric acid solution on chemically functionalized silicon surfaces, and self-adsorption on passivated titanium surfaces were used. All fabricated sources were characterized by using alpha spectrometry, radiographic imaging, and scanning electron microscopy. A direct validation for the estimated recoil ion rate was obtained by collecting $^{228}$Th recoil ions from $^{232}$U recoil ion sources prepared by self-adsorption and Molecular Plating. The chelation and the self-adsorption based approaches appear most promising for the preparation of recoil ion sources delivering monochromatic recoil ions.
Submission history
From: Raphael Haas [view email][v1] Mon, 6 Apr 2020 11:38:41 GMT (22069kb,D)
[v2] Mon, 16 Nov 2020 08:43:56 GMT (8671kb,D)
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