Title: Towards 233U recoil ion sources providing 229Th ions with minimum energy spread

Abstract: Four different techniques were applied for the production of 233U alpha recoil ion sources, providing 229Th ions. They were compared with respect to a minimum energy spread of the 229Th recoil ions, using the emitted alpha particles as an indicator. The techniques of Molecular Plating, Drop-on-Demand inkjet printing, chelation from dilute nitric acid solution on chemically functionalized silicon surfaces, and self-adsorption on passivated titanium surfaces were used. All fabricated sources were characterized by using alpha spectrometry, radiographic imaging, and scanning electron microscopy. The complexation and the self-adsorption based approaches are most promising for the preparation of recoil ion sources delivering monochromatic recoil ions.