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Condensed Matter > Materials Science
Title: Raman spectroscopy of ion irradiated SiC: chemical defects, strain, annealing, and oxidation
(Submitted on 29 Apr 2020 (v1), last revised 2 Jul 2020 (this version, v3))
Abstract: Raman spectroscopy has been used to identify defective bonding in neon and silicon ion irradiated single crystals of 6H-SiC. Observable differences exist in the C-C bonding region corresponding to different defect structures for neon and silicon ion implantations. Raman spectra of ion irradiated SiC show less tensile strain than neutron irradiations, explained by a residual compressive stress caused by the swelling constrained by the undamaged substrate. Evidence of oxidation during high temperature ion implantation is observed as C-O and Si-O Raman signals. Annealing irradiated SiC while acquiring Raman spectra shows rapid recovery of Si-C bonding, but not a complete recovery of the unirradiated structure. Annealing irradiated SiC causes surface oxidation where unirradiated SiC does not oxidise. Comparisons are made to the apparent radiation resistance of diamond and silicon which have similar crystal structures, but are monatomic, leading to the suggestion that chemical defects are responsible for increased radiation damage in SiC.
Submission history
From: Alexander Leide [view email][v1] Wed, 29 Apr 2020 17:07:48 GMT (1140kb)
[v2] Thu, 30 Apr 2020 08:55:17 GMT (1140kb)
[v3] Thu, 2 Jul 2020 21:09:06 GMT (1365kb)
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