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Condensed Matter > Materials Science

Title: Sub-nanometer thin Conformal Aluminum Oxide Coating Created by Interconversion of SiO2 via Hydrogen Plasma-assisted Atomic Layer Deposition

Abstract: We present a route towards ultrathin and continuous aluminum oxide (AlOx) coatings on silicon substrates for the spatial control of the charge density. X-ray photoelectron spectroscopy provides strong indication for the chemical reduction of SiO2 and its transformation into AlOx following exposure to trimethylaluminum and hydrogen plasma. Tailoring the growth parameters of plasma-assisted atomic layer deposition allows to achieve partial conversion of SiO2, resulting in ~0.4 nm thin continuous AlOx coatings that can be deposited at low-temperatures (70 {\deg}C) in selected regions defined by lithographic patterning. We envision applications for local gating, carrier selective contacts in silicon solar cells and selective surface functionalization.
Comments: main manuscript: 17 pages, 4 figures; supporting information: 6 pages, 5 figures
Subjects: Materials Science (cond-mat.mtrl-sci); Applied Physics (physics.app-ph)
Cite as: arXiv:2111.00054 [cond-mat.mtrl-sci]
  (or arXiv:2111.00054v1 [cond-mat.mtrl-sci] for this version)

Submission history

From: Alex Henning [view email]
[v1] Fri, 29 Oct 2021 19:27:01 GMT (1162kb)
[v2] Sat, 24 Sep 2022 14:21:15 GMT (1903kb)

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