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Condensed Matter > Materials Science

Title: Atomic-scale Oxygen-mediated Etching of 2D MoS$_2$ and MoTe$_2$

Abstract: Some of the materials are more affected by oxidation than others. To elucidate the oxidation-induced degradation mechanisms in transition metal chalcogenides, the chemical effects in single layer MoS$_2$ and MoTe$_2$ were studied in situ in an electron microscope under controlled low-pressure oxygen environments at room temperature.Oxidation is the main cause of degradation of many two-dimensional materials, including transition metal dichalcogenides, under ambient conditions. MoTe$_2$ is found to be reactive to oxygen, leading to significant degradation above a pressure of 1$\times 10^{-7}$ torr. Curiously, the common hydrocarbon contamination found on practically all surfaces accelerates the damage rate significantly, by up to a factor of forty. In contrast to MoTe$_2$, MoS$_2$ is found to be inert under oxygen environment, with all observed structural changes being caused by electron irradiation only, leading to well-defined pores with high proportion of molybdenum nanowire-terminated edges. Using density functional theory calculations, a further atomic-scale mechanism leading to the observed oxygen-related degradation in MoTe$_2$ is proposed and the role of the carbon in the etching is explored. Together, the results provide an important insight into the oxygen-related deterioration of two-dimensional materials under ambient conditions relevant in many fields.
Comments: 17 pages, 9 figures and 3 tables
Subjects: Materials Science (cond-mat.mtrl-sci); Mesoscale and Nanoscale Physics (cond-mat.mes-hall)
Cite as: arXiv:2205.00855 [cond-mat.mtrl-sci]
  (or arXiv:2205.00855v1 [cond-mat.mtrl-sci] for this version)

Submission history

From: Jani Kotakoski [view email]
[v1] Mon, 2 May 2022 12:38:06 GMT (22493kb,D)

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