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Physics > Instrumentation and Detectors

Title: Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers

Abstract: We developed a process to fabricate nanoscale metallic gate electrodes on scanning probe cantilevers, including on the irregular surface of protruding cantilever tips. The process includes a floating-layer technique to coat the cantilevers in electron-beam resist. We demonstrate gate definition through a lift-off process, as well as through an etching process. The cantilevers maintain a high force sensitivity after undergoing the patterning process. Our method allows the patterning of nanoscale devices on fragile scanning probes, extending their functionality as sensors.
Subjects: Instrumentation and Detectors (physics.ins-det); Mesoscale and Nanoscale Physics (cond-mat.mes-hall); Applied Physics (physics.app-ph)
Cite as: arXiv:2209.11503 [physics.ins-det]
  (or arXiv:2209.11503v1 [physics.ins-det] for this version)

Submission history

From: Floris Braakman [view email]
[v1] Fri, 23 Sep 2022 10:06:52 GMT (7339kb,D)

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