References & Citations
Condensed Matter > Materials Science
Title: Monte-Carlo Simulation of Pulsed Laser Deposition
(Submitted on 24 Jul 2002)
Abstract: Using the Monte Carlo method, we have studied the pulsed laser deposition process at the sub-monolayer regime. In our simulations, dissociation of an atom from a cluster is incorporated. Our results indicate that the pulsed laser deposition resembles molecular beam epitaxy at very low intensity, and that it is characteristically different from molecular beam epitaxy at higher intensity. We have also obtained the island size distributions. The scaling function for the island size distribution for pulsed laser deposition is different from that of molecular beam epitaxy.
Link back to: arXiv, form interface, contact.