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Condensed Matter > Materials Science

Title: New cellular automaton designed to simulate epitaxial films growth

Authors: R.Kosturek, K.Malarz (AGH-UST)
Abstract: In this paper a simple (2+1) solid-on-solid model of the epitaxial films growth based on random deposition followed by breaking particle-particle lateral bonds and particles surface diffusion is introduced. The influence of the critical number of the particle-particle lateral bonds $z$ and the deposition rate on the surface roughness dynamics and possible surface morphology anisotropy is presented. The roughness exponent $\alpha$ and the growth exponent $\beta$ are $(0.863,0.357)$, $(0.215,0.123)$, $(0.101,0.0405)$ and $(0.0718,0.0228)$ for $z=1$, 2, 3 and 4, respectively. Snapshots from simulations of the growth process are included.
Comments: 10 pages, elsart, 5 figures in 20 files
Subjects: Materials Science (cond-mat.mtrl-sci); Cellular Automata and Lattice Gases (nlin.CG)
Journal reference: Physica A345 (2005) 538
DOI: 10.1016/j.physa.2004.08.013
Cite as: arXiv:cond-mat/0406677 [cond-mat.mtrl-sci]
  (or arXiv:cond-mat/0406677v1 [cond-mat.mtrl-sci] for this version)

Submission history

From: Krzysztof Malarz [view email]
[v1] Mon, 28 Jun 2004 13:10:20 GMT (245kb)

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