We gratefully acknowledge support from
the Simons Foundation and member institutions.
Full-text links:

Download:

Current browse context:

cond-mat

References & Citations

Bookmark

(what is this?)
CiteULike logo BibSonomy logo Mendeley logo del.icio.us logo Digg logo Reddit logo

Condensed Matter > Superconductivity

Title: Comment on "Variation of the superconducting transition temperature of hole-doped copper oxides"

Abstract: We point out the incorrect derivation of the gap equation in X.-J. Chen and H. Q. Lin [Phys. Rev. B 69 (2004) 104518; cond-mat/0306680] within the interlayer tunneling (ILT) model for multilayered cuprates. There, the local structure in k-space of the ILT effective interaction has not been taken into due account when the ILT model is generalized to the case of n layers per unit cell. This is a specific characteristic of the ILT model that, apart from giving rise to a highly nontrivial k-dependence of the gap function, is known to enhance the critical temperature Tc in a natural way. As a consequence, we argue that Chen and Lin's results cannot be employed, in their present form, for a quantitative interpretation of the high-pressure dependence of Tc in Bi-2212, as is done by X.-J. Chen et al. [cond-mat/0408587]. Moreover, when the generalization of X.-J. Chen et al. [cond-mat/0408587] is applied to the case n=2, it fails to reproduce the original ILT gap equation. However, a more careful analysis of the ILT model for multilayered cuprates, taking into account the nonuniform hole distribution among inequivalent layers, has been earlier suggested to describe the observed pressure dependence of Tc in homologous series of high-Tc cuprates.
Subjects: Superconductivity (cond-mat.supr-con); Strongly Correlated Electrons (cond-mat.str-el)
Cite as: arXiv:cond-mat/0409462 [cond-mat.supr-con]
  (or arXiv:cond-mat/0409462v1 [cond-mat.supr-con] for this version)

Submission history

From: Giuseppe G. N. Angilella [view email]
[v1] Fri, 17 Sep 2004 15:47:36 GMT (8kb)

Link back to: arXiv, form interface, contact.