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Condensed Matter > Materials Science

Title: On continuum modeling of sputter erosion under normal incidence: interplay between nonlocality and nonlinearity

Abstract: Under specific experimental circumstances, sputter erosion on semiconductor materials exhibits highly ordered hexagonal dot-like nanostructures. In a recent attempt to theoretically understand this pattern forming process, Facsko et al. [Phys. Rev. B 69, 153412 (2004)] suggested a nonlocal, damped Kuramoto-Sivashinsky equation as a potential candidate for an adequate continuum model of this self-organizing process. In this study we theoretically investigate this proposal by (i) formally deriving such a nonlocal equation as minimal model from balance considerations, (ii) showing that it can be exactly mapped to a local, damped Kuramoto-Sivashinsky equation, and (iii) inspecting the consequences of the resulting non-stationary erosion dynamics.
Comments: 7 pages, 2 Postscript figures, accepted by Phys. Rev. B corrected typos, few minor changes
Subjects: Materials Science (cond-mat.mtrl-sci)
DOI: 10.1103/PhysRevB.72.035416
Cite as: arXiv:cond-mat/0501049 [cond-mat.mtrl-sci]
  (or arXiv:cond-mat/0501049v2 [cond-mat.mtrl-sci] for this version)

Submission history

From: Sebastian Vogel [view email]
[v1] Tue, 4 Jan 2005 15:25:46 GMT (181kb)
[v2] Tue, 5 Apr 2005 10:15:44 GMT (181kb)

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