We gratefully acknowledge support from
the Simons Foundation and member institutions.
Full-text links:

Download:

(license)

Current browse context:

cond-mat
< prev | next >
new | recent | 9712

References & Citations

Bookmark

(what is this?)
CiteULike logo BibSonomy logo Mendeley logo del.icio.us logo Digg logo Reddit logo

Condensed Matter > Materials Science

Title: Quantitative Imaging of Sheet Resistance with a Scanning Near-Field Microwave Microscope

Authors: D. E. Steinhauer, C. P. Vlahacos, S. K. Dutta, B. J. Feenstra, F. C. Wellstood, Steven M. Anlage
(Submitted on 15 Dec 1997)
Abstract: We describe quantitative imaging of the sheet resistance of metallic thin films by monitoring frequency shift and quality factor in a resonant scanning near-field microwave microscope. This technique allows fast acquisition of images at approximately 10 ms per pixel over a frequency range from 0.1 to 50 GHz. In its current configuration, the system can resolve changes in sheet resistance as small as 0.6 Ohms/sq for 100 Ohms/sq films. We demonstrate its use at 7.5 GHz by generating a quantitative sheet resistance image of a YBa2Cu3O7 (YBCO) thin film on a 5 cm-diameter sapphire wafer.
Comments: 6 pages, 3 figures; To be published in Appl. Phys. Lett. (2/16/98); See also Steinhauer et al., Appl. Phys. Lett., vol. 71, p. 1736 (1997) cond-mat/9712142; See also this http URL
Subjects: Materials Science (cond-mat.mtrl-sci); Superconductivity (cond-mat.supr-con)
Journal reference: Appl. Phys. Lett., vol. 72, no. 7, p. 861 (1998)
DOI: 10.1063/1.120918
Cite as: arXiv:cond-mat/9712171 [cond-mat.mtrl-sci]
  (or arXiv:cond-mat/9712171v1 [cond-mat.mtrl-sci] for this version)

Submission history

From: D. E. Steinhauer [view email]
[v1] Mon, 15 Dec 1997 20:12:50 GMT (134kb)
Which authors of this paper are endorsers? | Disable MathJax (What is MathJax?)

Link back to: arXiv, form interface, contact.