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Condensed Matter > Materials Science

Title: Thermal conductivity of crystalline AlN and the influence of atomic-scale defects

Abstract: Aluminum nitride (AlN) plays a key role in modern power electronics and deep-ultraviolet photonics, where an understanding of its thermal properties is essential. Here we measure the thermal conductivity of crystalline AlN by the 3${\omega}$ method, finding it ranges from 674 ${\pm}$ 56 W/m/K at 100 K to 186 ${\pm}$ 7 W/m/K at 400 K, with a value of 237 ${\pm}$ 6 W/m/K at room temperature. We compare these data with analytical models and first principles calculations, taking into account atomic-scale defects (O, Si, C impurities, and Al vacancies). We find Al vacancies play the greatest role in reducing thermal conductivity because of the largest mass-difference scattering. Modeling also reveals that 10% of heat conduction is contributed by phonons with long mean free paths, over ~7 ${\mu}$m at room temperature, and 50% by phonons with MFPs over ~0.3 ${\mu}$m. Consequently, the effective thermal conductivity of AlN is strongly reduced in sub-micron thin films or devices due to phonon-boundary scattering.
Subjects: Materials Science (cond-mat.mtrl-sci); Mesoscale and Nanoscale Physics (cond-mat.mes-hall)
Journal reference: J. Appl. Phys. 126, 185105 (2019)
DOI: 10.1063/1.5097172
Cite as: arXiv:1904.00345 [cond-mat.mtrl-sci]
  (or arXiv:1904.00345v3 [cond-mat.mtrl-sci] for this version)

Submission history

From: Runjie Xu [view email]
[v1] Sun, 31 Mar 2019 06:11:45 GMT (1559kb)
[v2] Tue, 9 Apr 2019 17:51:48 GMT (1559kb)
[v3] Sun, 8 Dec 2019 07:05:22 GMT (2810kb)

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