Title: RF-quantum capacitance of the topological insulator Bi2Se3 in the bulk depleted regime for field-effect transistors

Abstract: A Metal-dielectric-topological insulator capacitor device based on hBN-encapsulated CVD grown Bi2Se3 is realized and investigated in the radio frequency regime. The RF quantum capacitance and device resistance are extracted for frequencies as a high as 10 GHz, and studied as a function of the applied gate voltage. The combination of the superior quality hBN dielectric gate with the optimized transport characteristics of CVD grown Bi2Se3 (n~10^18cm-3 in 8 nm) allow us to attain a bulk depleted regime by dielectric gating. A quantum capacitance minimum is observed revealing a purely Dirac regime, where the Dirac surface state in proximity to the gate reaches charge neutrality, but the bottom surface Dirac cone remains charged, and couples capacitively to the top surface via the insulating bulk. Our work paves the way towards implementation of topological materials in RF devices.